QUALITY EVALUATION OF THIN FILM TENZOSTRUKTUR MDM 

Cheburakhin Igor' Nikolaevich, chief of shop 54, Scientific-research Institute of physical measurements, niifi@sura.ru
Nefed'ev Dmitriy Ivanovich, doctor of technical sciences, head of sub-department of information and measuring equipment, Penza State University, iit@pnzgu.ru

 621.3.049.772.1

Research methods for rapid assessment of quality of thin-film tenzostruktur in metal-insulator-metal (MDM) obtained by the method of spraying in vacuum on metal substrates-elastic elements (UE) used for the manufacture of pressure sensors. Shown that the proposed decision with significant saving of time and costs to evaluate defect density (sinks, pores, foreign and others) as a working surface polished, UE and in layers in thin film structure MDM technology phases, and analysis of the non-conditioned Jae (tehothoda), appearing in the production process.

elastic element (UE), the sensitive element (CHE), dielectric, sputtering, scheme, polished, pores, sinks, inclusion, exclusion, defects.